Abstract
Ion implantation is one of the modern methods of the surface modification of various materials. Industrially used Ti–6Al–4V titanium alloy and commercially pure Ti grade 2 were characterized using the X–ray diffraction methods. Texture of the material and dependence of the microstructural properties on the method of the surface modification were examined in order to determine suitable conditions for application of the process in the industry. The structure of Ti–6Al–4V alloy before and after the nitrogen ion implantation process is discussed and observed surface hardening is explained.
Highlights
Ti–6Al–4V titanium alloy and commercially pure Ti grade 2 are materials widely used in the industry and the biomedicine for their low density, high tensile strength, biocompatibility and resistance to corrosion in some common environments
Concerning the titanium and its alloys, creation of hard TiNx phases [1] or stabilization of the α–Ti phase [2] leading to the increase of the surface hardness is expected
After the nitrogen ion implantation into Ti–6Al–4V samples using the suitable implantation parameters, desired surface hardening is observed as proven by the typical depth profile of the nanoindentation hardness (Figure 7) [4]
Summary
Ti–6Al–4V titanium alloy ( called Ti grade 5) and commercially pure Ti grade 2 are materials widely used in the industry and the biomedicine for their low density, high tensile strength, biocompatibility and resistance to corrosion in some common environments. Disadvantages of the titanium alloys for their applications are their poor performance in sliding, insufficient surface hardness and insufficient resistance to some chemical environments. For these reasons is the surface of common titanium alloys often modified. Compared to the other commonly used surface modification methods, the advantages of the nitrogen ion implantation are the ability to control the process precisely Compared to the other commonly used surface modification methods, the advantages of the nitrogen ion implantation are the ability to control the process precisely (esp. the fluence of the implanted ions, their energy and the depth distribution) and so the ability of automating the process and the possibility to implant at the low temperatures
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