Abstract
AbstractThe surface chemical changes induced in polystyrene, polypropylene and poly(ethylene terephthalate) (PET) by argon and oxygen rf sputter etching were studied by XPS and infrared reflection absorption spectroscopy (IRRAS). Thin (∼5nm) chemically modified surface layers were observed for all three materials. Polystyrene surfaces were oxidized by sputter etching in both oxygen and argon with differing chemical functionality resulting from etching in the different gases. Polypropylene surfaces, by contrast, were oxidized with similar chemical functionality resulting from etching in either gas. PET surfaces were oxidized slightly by oxygen sputter etching and reduced by argon sputter etching. For the model systems chosen, etch mechanisms are suggested based on trends in the chemical modification behavior.
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