Surface characterization of plasma-polymerized cyclohexane thin film

Abstract

A plasma-polymerized cyclohexane (PPCHex) thin film was characterized by using Fourier transform infrared spectroscopy, x-ray photoelectron spectroscopy, and time-of-flight secondary ion mass spectrometry along with a principal component analysis (PCA). The PPCHex thin film was deposited onto a silicon substrate by using an inductively coupled plasma chemical vapor deposition method and cyclohexane as a precursor. The chemical composition of the PPCHex surface was controlled in a reproducible manner as a function of substrate bias plasma power. A PCA of the TOF-SIMS data also gave systematic insight into the surface chemical compositions and molecular cross-linking on plasma-polymerized thin films as a function of substrate bias plasma power. PPCHex thin film made at 100W plasma power had the least amount of oxygen functional groups such as the C–O–H form on the surface than the one made at 10W plasma power.