Abstract
Chemical composition and surface morphology of Ni–Ga–Fe thin films grown under various sputtering powers and argon gas pressures by r.f. magnetron sputtering technique are studied. X-ray fluorescence results show that the sputtering power has obvious effect on the chemical composition of Ni–Ga–Fe thin films. The argon gas pressure has little effect on the composition of Ni–Ga–Fe thin films. The change in surface morphology of Ni–Ga–Fe films is discussed in terms of root-mean-square (rms) surface roughness values. The grain size and the rms of Ni–Ga–Fe thin films increase with the increase of sputtering power and argon gas pressure. The film deposited at room temperature has a cubic L2 1 structure and the annealed film shows martensitic structure.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
