Surface analysis of palladium boride liquid metal ion beam deposition on silicon single-crystal solid surface

Abstract

Surface analysis of a palladium boride liquid metal ion beam deposition on a silicon single-crystal (100) solid surface was analyzed by optical microscopy, Auger electron spectroscopy, and Rutherford backscattering spectroscopy. The beam composition prior to the deposition on silicon was analyzed with a quadrupole mass spectrometer. Droplet formation was observed experimentally from a 10-μm emitter tip radius which can be estimated from calculation to be due to higher mass flow rate associated with a larger emitting tip radius. Auger electron spectroscopy results show that the main element contaminants (Fe, Ni, Cr, and Re) come mostly from extractor material (Fe, Ni, and Cr) sputtering, and emitter tip erosion. Rutherford backscattering analysis of beam deposit from a 10-μm emitter tip radius on silicon surface shows no change in stoichiometry between the deposit and alloy source despite droplet formation on silicon surface.