Abstract
AbstractThe distributions of elements were analyzed at oxide scale surface and around the oxide scale/alloy interfaces. Glow discharge optical emission spectrometry (GDOES) depth profiles and secondary ion mass spectrometry (SIMS) imaging have been applied to analyze the oxide scales formed on FeCr alloys in CH4H2O (thickness from 100 nm to 4 µm, at 1073 K for 3 to 1050 h). The oxide scale is identified as the following phases from surface to inner oxide: MnFe oxide spinel, Cr2O3 oxide, SiO2, Al2O3 inner oxide and FeCr alloy. The concentration of Si was estimated from the quantitative analysis of Si with the GDOES depth analysis. The Si concentration increases with the oxidation duration and the highest concentration after 1050 h treatment is estimated to be 4.9 mass% from the quantitative analysis of Si. Copyright © 2006 John Wiley & Sons, Ltd.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
