Abstract
Well ordered films on Si(SiO 2 ) substrates are prepared by Vapor Deposition(VD) in vacuum of 10 -4 Pa using substituted diphenyl-1,3,4-oxadiazoles. Results of X-ray Specular Reflectivity(XSR) reveal a bilayer-by-bilayer film growth. The film periodicity in normal direction shows a linear dependence on the length of the substituted aliphatic chain. This dependence is used to draw conclusions regarding the tilt of the aromatic and aliphatic unit of the film with respect to the substrate normal direction.
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