Supramolecular layer-by-layer assembly of 3D multicomponent nanostructures via multivalent molecular recognition.

Xing Yi Ling,G Julius Vancso,In Yee Phang,Jurriaan Huskens,David N Reinhoudt

doi:10.3390/ijms9040486

Xing Yi Ling, G Julius Vancso + Show 3 more

Open Access

https://doi.org/10.3390/ijms9040486

Copy DOI

Abstract

The supramolecular layer-by-layer assembly of 3D multicomponent nanostructures of nanoparticles is demonstrated. Nanoimprint lithography (NIL) was used as the patterning tool for making patterned beta-cyclodextrin (CD) self-assembled monolayers (SAMs) and for the confinement of nanoparticles on the substrate. A densely packed and multilayered nanoparticle structure was created by alternating assembly steps of complementary guest- (Fc-SiO(2), 60 nm) and host-functionalized (CD-Au, 3 nm) nanoparticles. The effects induced by the order of the nanoparticle assembly steps, going from large to small and from small to large nanoparticles by using Fc-SiO(2), CD-Au, and CD-SiO(2) (350 nm) nanoparticles, were compared. AFM height profiles revealed that the specific supramolecular assembly of nanoparticles was self-limited, i.e. one nanoparticle layer per assembly step, allowing the control over the thickness of the supramolecular hybrid nanostructure by choosing the size of the nanoparticles, irrespective of the core material of the nanoparticles. The roughness of structure, observed by AFM imaging of the top layer, was directly influenced by the size and packing of the underlying nanoparticle layers.

Highlights

The assembly of three-dimensional composite nanomaterials has attracted a lot of interest owing to their fascinating optical, electrical and chemical properties that are different from the respective bulk materials [1,2,3,4], and to the need for the development of functional and miniaturized particle-based devices
Our group reported the use of nanoimprint lithography (NIL) as a tool to pattern selfassembled monolayers (SAMs) and nanoparticles on silicon substrates, which allows patterning of 3D features [26]
An aminoalkylsilane monolayer was first formed on the uncovered regions of the NILpatterned substrates, which resulted in selective attachment of carboxylate-functionalized polystyrene and silica nanoparticles onto the patterned surfaces by electrostatic interactions

Summary

Introduction

The assembly of three-dimensional composite nanomaterials has attracted a lot of interest owing to their fascinating optical, electrical and chemical properties that are different from the respective bulk materials [1,2,3,4], and to the need for the development of functional and miniaturized particle-based devices. Several assembly techniques have been studied in order to direct nanoparticles into single or multicomponent 3D nanomaterials on surfaces These are grouped in physical assembly techniques, e.g. convective assembly [5,6], spin coating [7], and spraying [8], and chemical assembly ones, e.g. electrostatic interactions [9,10,11,12,13], thiol-based self-assembly [14,15], supramolecular chemistry [16,17,18], and coordination chemistry [19]. An aminoalkylsilane monolayer was first formed on the uncovered regions of the NILpatterned substrates, which resulted in selective attachment of carboxylate-functionalized polystyrene and silica nanoparticles onto the patterned surfaces by electrostatic interactions

Objectives

Results

Conclusion