Supramolecular 3,4:9,10-perylenetetracarboxylic diimide triads containing moieties of sumanene polyphenol derivative: Synthesis and photochemical transformations

Abstract

A polyphenol derivative of the sumanene-containing triad with a central perylenetetracarboxylic diimide moiety was synthesized via several consecutive chemical transformations of N,N'-bis(3',5'-dimethoxybenzyl)-1,7-bis[4''-(N,N'-disumanenyl)aminophenyl]perylene-3,4:9,10-tetracarboxylic diimide. The phenolic hydroxyl groups of the resulting derivative were partly protected by introduction of two different protective groups, pentaspiran and tert-butyl butyrate ones. It was shown that this modified derivative can be used to obtain a promising positive-tone photoresists with high parameters for extreme ultraviolet nanolithography on exposure to light at 13.5 nm for the manufacture of 20 to 16 nanometer chips.