Supersonic cluster beam deposition of nanostructured thin films with uniform thickness via continuously graded exposure control

Abstract

Supersonic cluster beam deposition is a powerful technique for the production of nanostructured thin films and the microfabrication with stencil masks of patterns with very good lateral resolution. The high focusing of cluster beam typical of supersonic expansions causes the deposition of films with strong thickness variation over a small area. To overcome this problem we have designed and tested a rotating screen allowing a continuously graded exposure of the substrate during cluster beam deposition. This allows the production of nanostructured films with uniform thickness over a large area while keeping all the features typical of supersonic beams.