Abstract
Based on surface plasmon resonant enhancement, a method to realize photolithography beyond diffraction limit by using polystyrene spheres (PSs) self-assembled on silver slab was proposed in this paper. The optimum parameters for PS with different diameters were presented. In order to verify this method, numerical simulation on a typical configuration with 1.5 microm diameter of PS was carried out by using the finite-difference time-domain (FDTD) method, and the minimum feature size of 88 nm beyond diffraction limit at 365 nm working wavelength was obtained.
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