Abstract
A dual-gate superjunction insulated gate bipolar transistor (IGBT) (DG-SJ-IGBT) is proposed and studied with numerical TCAD simulations. The new structure utilizes the superjunction structure as a controlling port for the strength of conductivity modulation inside the IGBT, so that a low ${V}_{\text {ON}}$ is obtained by a strong conductivity modulation during ON-state and a near-unipolar turn-off is achieved by removing the minority carriers before the turn-off event. For this purpose, the p-pillar in the DG-SJ-IGBT is connected to the p-body using a built-in p-channel MOSFET. The primary gate and the auxiliary gate (i.e., gate of p-MOSFET) are controlled by two separate driving signals. In the IGBT’s ON-state, the p-MOSFET disconnects the p-pillar, enabling full conductivity-modulated bipolar conduction and a consequent low ${V}_{\text {ON}}$ . As a well-known issue, conductivity modulation is accompanied by significant additional turn-off loss ( ${E}_{\text {OFF}}$ ). To overcome this issue, the DG-SJ-IGBT takes advantage of the p-pillar which extends through the entire drift region. Before the IGBT’s turn-off event, the p-MOSFET electrically grounds the p-pillar to the p-body. The grounded p-pillar serves as a hole extractor, suppresses the minority carrier density throughout the depth of the drift region, and brings the device into a near-unipolar conduction mode. Thus, a near-unipolar turn-off can be obtained, resulting in a low ${E}_{\text {OFF}}$ .
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