Abstract

The present study substantiate that ultraviolet-nanoimprint lithography (UV-NIL) can be used to transfer a one-dimensional nano-pattern onto a high-k thin film of aluminum oxide mixed with a UV photocuring agent. Polydimethylsiloxane (PDMS) molds fabricated on silicon wafers were made using deep ultraviolet laser interference lithography in order to investigate one-dimension nanopatterns. These imprinted nano-patterns induce geometric deformations in the liquid crystal (LC), creating collective and elastic properties, which act as a guide for homogeneous alignment. The nanoimprint method can process a large area, so it can be processed much easier, faster, and more accurately than the conventional rubbing method. Moreover, the optical properties of the nano-imprinted aluminum oxide (AlO) thin-film are about 1.5p% superior to that of conventional commercialized cells, so it has a high effect on the luminance and color gamut of the display. After pattern imprinting, atomic force microscope (AFM) was performed to confirm the result. We can compared the cycle of AlO mixed with UV photocuring agent PDMS pattern cycle, the period is 776 and 750 nm, the width is 468 and 450 nm, the spacing is 292 and 300 nm, and the height is 40 and 30 nm. The nano-imprinted film appears to replicate the width, amplitude, and spacing of the PDMS template. In addition, X-ray photoelectron spectroscopy was performed to determine the chemical properties of the thin film and it was confirmed that UV irradiation induces oxidation, thus increases the intensity significantly. The binding energies of Al 2p and C–O spectra were situated at 74.27 ± 0.5 eV and 531.78 ± 0.5 eV, respectively.

Highlights

  • The display industry is becoming essential in various elds our lives

  • liquid crystal (LC) alignment on the aluminum oxide (AlO) mixed with UV photocuring agent layers is comparable to the UV irradiated time in an anti-parallel LC cell via polarized optical microscopy (POM)

  • We demonstrated the results of an AlO solution with a UV curable polymer pattern applied the LC alignment cells

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Summary

Introduction

The UV NIL method, which is widely used in the TFT eld, has advantages such as high throughput, low cost-effectiveness, large process, high thermal endurance, and low temperature processing. UV NIL can be used in the manufacturing of exible plastic electronic devices in a roll-toroll process These advantages enable, the nanostructures of the LCs to uniformly align in the same direction. Various surface changes, which have a great in uence on the excellent LC arrangement, according to the UV irradiation time were observed, by AFM and XPS. This was con rmed by the morphology and chemical changes of the thin lm surface that enable the homogeneous alignment of the LC for the topographic grating of the one-dimensional nano-pattern served as the director care of LC alignment. To con rm this LC alignment, we used polarized optical microscope investigations and crystal rotation measurements

Shi a pattern from PDMS template to UV curable solution
Experiment
One dimensional nano pattern
Measurement of the properties of thin- lm nanoimprint patterns
Measurement of transmittance of UV-vis graph
POM and pretilt measurement and analysis for LCs alignment
Determine of pattern transferred via analysis of AFM
XPS analysis of AlO spectra change according to UV irradiation
Conclusions
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