Abstract

Electrically driven light sources are essential in a wide range of applications, from indication and display technologies to high-speed data communication and quantum information processing. Wide-bandgap semiconductors promise to advance solid-state lighting by delivering novel light sources. However, electrical pumping of these devices is still a challenging problem. Many wide-bandgap semiconductor materials, such as SiC, GaN, AlN, ZnS, and Ga2O3, can be easily n-type doped, but their efficient p-type doping is extremely difficult. The lack of holes due to the high activation energy of acceptors greatly limits the performance and practical applicability of wide-bandgap semiconductor devices. Here, we study a novel effect which allows homojunction semiconductor devices, such as p-i-n diodes, to operate well above the limit imposed by doping of the p-type material. Using a rigorous numerical approach, we show that the density of injected holes can exceed the density of holes in the p-type injection layer by up to four orders of magnitude depending on the semiconductor material, dopant, and temperature, which gives the possibility to significantly overcome the doping problem. We present a clear physical explanation of this unexpected feature of wide-bandgap semiconductor p-i-n diodes and closely examine it in 4H-SiC, 3C-SiC, AlN, and ZnS structures. The predicted effect can be exploited to develop bright-light-emitting devices, especially electrically driven nonclassical light sources based on color centers in SiC, AlN, ZnO, and other wide-bandgap semiconductors.

Highlights

  • The possibility to create a high density of nonequilibrium charge carriers in the active region of semiconductor optoelectronic devices is essential for a wide range of optoelectronic applications, from light emitting diodes (LEDs) [1] and injection lasers [2,3] to electro-optic modulators [4,5]

  • The activation energies of acceptors in silicon carbide are high, which limits the density of holes in the p-type material to 1014 –1015 cm−3, the p-type doping problem is even more pronounced in such materials as gallium nitride, aluminum nitride, and zinc sulfide

  • We have numerically demonstrated the superinjection of holes in homojunction p-i-n diodes based on different wide-bandgap semiconductors. This effect gives the possibility to create a high density of nonequilibrium holes in the i-region of the p-i-n diode at high forward bias voltages

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Summary

Introduction

The possibility to create a high density of nonequilibrium charge carriers in the active region of semiconductor optoelectronic devices is essential for a wide range of optoelectronic applications, from light emitting diodes (LEDs) [1] and injection lasers [2,3] to electro-optic modulators [4,5]. Wide-bandgap semiconductors are quite unique materials, which are at the interface between conventional semiconductors and insulators They can demonstrate both n-type and p-type conductivity, but typically suffer from the lack of either electrons or holes due to the extremely high activation energies of dopants and nonzero compensation of donors (acceptors) by acceptor-type (donor-type) impurities [10,11,12,13,14]. Due to this problem, the density of free carriers in the n-type or p-type injection layer can be many orders of magnitude lower than the donor or acceptor concentration, respectively.

Superinjection of Holes in 4H-SiC Diodes
Impact of Doping of the n-type Injection Layer
Impact of the Activation Energy of Acceptors
Impact of Temperature
ZnS and AlN Diodes
Conclusions
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