Abstract
Superconducting NbNx thin films were deposited by plasma-enhanced atomic layer deposition (PEALD) using the metal organic precursor (tert-butylimido)-tris (diethylamino)-niobium (TBTDEN) and hydrogen plasma. The transition temperature TC and the resistivity of the NbN thin films were measured by four-point probe measurement. Their composition was analyzed by x-ray diffraction and Rutherford backscattering spectroscopy. The deposition process was optimized to obtain a low resistivity as well as a high superconducting transition temperature. A TC close to 10 K and a resistivity of 2.5 μΩ m as well as a critical current density of 8.9 × 105 A cm−2 were achieved. Originally, a high oxygen concentration was detected in the compound. By variation of the plasma parameters, the concentration could be reduced from 57 atom (at.)% to 11 at.%. Because of the excellent thickness control and conformality, such ALD films may be suited very well for applications in superconductor electronics and sensing devices.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
