Abstract
Recently, we have demonstrated that second-order subwavelength interference could be realized in an optical lithography scheme with an effective entangled source [P. Hong and G. Zhang, Phys. Rev. A 88, 043838 (2013)]. In this paper, by considering the correlation function in both the source plane and observation plane, we show how the coherence property of such a source is controlled via introduction of random-phase correlation, which finally affects the two-photon interference effect observed in the far-field plane. Furthermore, by introducing different but similar random-phase correlations, we generalize the phase controlled source with particular high-order coherence properties to obtain higher-order subwavelength interference, i.e., high-order super-resolved optical lithography. These results show the importance of phase control in generating a light field with particular high-order coherence properties.
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