Abstract

We report a super-resolution imaging microscope adopting the spatially structured illumination that is able to providing super-resolution and high signal noise ratio images of submicron defects on the surface and subsurface of optical components in this research. Employing the combination of structured illumination microscopy (SIM) and reflective light scattering (RLS) microscope, RLS-SIM extends the transmission band of optical transfer function of the RLS microscopy, thereby improving resolution and breaking the conventional Rayleigh diffraction limit. With 633 nm illumination light source and 100×/0.8 objective, the reconstructed RLS-SIM image of natural defects on the optics component reveals the lateral limit resolution ~296 nm, a factor of 1.63 than that of the normal bright-field microscopy with the same parameters. Moreover, compared with traditional microscope (bright-field/dark-field) and SEM images, the RLS-SIM images are demonstrated to present the finer structures of submicron digs and scratches formed in the optics manufacturing process which have a good application prospect in the research of damage mechanism of precision optical components and the upgrading of processing technology.

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