Abstract
The paper shows that high-quality super-conducting Nb films can be deposited by means of arc discharges under ultra-high vacuum conditions. The critical temperatureT c of Nb-films obtained with a planar cathodic arc Ultra High Vacuum (UHV) system, is very close to that of pure bulk niobiumT c=9.26 K and the transition to super-conducting state is very narrow. The films have higher Residual Resistivity Ratio (RRR) values (up to 80) and larger grain sizes, as compared with sputtered Nb-films deposited at the same temperature.
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