Abstract
We propose a simple and flexible fabrication approach based on the moiré effect of photoresist gratings for rapid synthesis of apodized structures with continuously varying depth. Minor modifications in a standard laser interference lithography setup allow creating macroscopic, visible by naked eye moiré patterns that modulate the depth of subwavelength diffraction gratings. The spatial frequency of this modulation is easily controlled in a wide range, allowing to create a quasicrystal in extreme cases. Experimental results are confirmed by a theory with clear graphical solutions and numerical modeling. The method is universal and does not depend on a specific choice of photoresist and/or substrate materials, making it a promising choice for structured light applications, optical security elements or as a basic structuring method of complex optical devices.
Highlights
Nanopatterned surfaces play a crucial role in modern nanotechnology
We propose an approach of generating 2D macroscopic moiré patterns over the microscopic 1D diffraction gratings in a laser interference lithography (LIL) process by an exploitation of the incident wavefront curvature, which is ordinarily considered as a drawback of a LIL experimental bench
This paper demonstrates a novel LIL-based approach for generation of macroscopic visible by naked eye moiré patterns in 1D and 2D diffraction structures
Summary
Nanopatterned surfaces play a crucial role in modern nanotechnology. The permanent industrial need for miniaturization and integration demands compact, highly-effective optical devices with a complex organization. The resulting hierarchical structure yields combined optical properties of its components This way of grating development does not require supplementary materials and/or chemical procedures and usually utilizes wellknown fabrication approaches: 3D direct laser writing [14], electron-beam lithography [15], polymer film wrinkling [16], self-assembly [17] and laser interference lithography (LIL) [18]. In this article we propose an effective yet simple and inexpensive method for rapid formation of macroscopic moiré patterns over wafer-scale, 1D and 2D diffraction gratings using only minor modifications to a standard LIL setup. Together with sample rotations this approach allows for a high variety of possible moiré patterns We demonstrate this with gratings of 1 μm, 600 nm and 300 nm period.
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