Subsurface investigation of the surface modification of polydimethylsiloxane by 172‐nm vacuum ultraviolet irradiation using ToF‐SIMS and VUV spectrometry

Abstract

We investigate the mechanism of polydimethylsiloxane (PDMS) surface modification by 172‐nm vacuum ultraviolet (VUV) light. Time‐of‐flight secondary ion mass spectrometry and optical spectrometry are used to measure the chemical composition and VUV transmittance of the PDMS before and after surface modification, respectively. For modified samples of bulk PDMS, the VUV transmittance and the depth of the modified region increased with increasing VUV dose. This can be explained by the following self‐reinforcing cycle of (1) modification of PDMS by VUV light to a more silica‐like composition, (2) improvement of the VUV light transparency, and (3) deeper modification. For thin‐film samples of PDMS formed on sapphire substrates, the transmittance at 172 nm also increased with increasing VUV dose and exceeded that of sapphire in the region from 172 to 300 nm. Finally, thin‐film samples of PDMS formed on silicon substrates, which function as a VUV reflector, were also investigated. For these samples, the secondary ion depth profiles for several chemical species in the PDMS were oscillatory, probably due to the interference of the incident and reflected VUV light. These results strongly suggest that the photon energy of the VUV light plays an important role in modifying PDMS.