Substrate temperature effect on migration behavior of fluorocarbon film precursors in high-aspect ratio structures

Abstract

The authors investigate the effect of substrate temperature on the migration of fluorocarbon film precursor species into a model high aspect ratio feature with precise temperature control and shielding from direct plasma line of sight interactions. Increased substrate temperature shows fluorocarbon deposition further into the high aspect ratio feature and scales with aspect ratio for two different width gap sizes. Modeling of the deposition behavior suggests that multiple neutral species contribute to the deposition behavior, which have different survival rates as they travel into the high aspect ratio feature and experience encounters with surfaces. The work shows how slight changes in substrate temperature can be used to control migration behavior of neutral species in high aspect ratio features.