Abstract
Vanadium oxide (VOx) thin films were deposited on different substrates by reactive DC magnetron sputtering. Silicon substrate, Si<sub>3</sub>N<sub>4</sub>/Si substrate, glass substrate, and α-Al<sub>2</sub>O<sub>3</sub> substrate were adopted in experiments. Results revealed that the structural features of VOx thin films strongly depend on the substrates. Analysis of square resistance and its temperature dependence demonstrated that the crystal structure and the growth mode of VOx films play important roles in the film electrical properties. Experiments demonstrated that substrates have great influence on the growth mode and thermal resistance properties of VOx thin films.
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