Abstract

We present investigations on the interface formation between the hybrid perovskite MAPbI3 and various substrates, covering a wide range of work functions. The perovskite films are incrementally evaporated in situ while the electronic structure is evaluated using photoelectron spectroscopy. Our results show that there is an induction period in the growth of the perovskite during which volatile compounds are formed, catalyzed by the substrate. The duration of the induction period depends strongly on the nature of the substrate material, and it can take up to 20–30 nm of formal precursor deposition before the surface is passivated and the perovskite film starts forming. The stoichiometry of the 2–3 nm thin passivation layer deviates from the expected perovskite stoichiometry, being rich in decomposition products of the organic cation. During the regular growth of the perovskite, our measurements show a deviation from the commonly assumed flat band condition, i.e., dipole formation and band bending dominate the interface. Overall, the nature of the substrate not only changes the energetic alignment of the perovskite, it can introduce gap states and influence the film formation and morphology. The possible impact on device performance is discussed.

Highlights

  • We present investigations on the interface formation between the hybrid perovskite MAPbI3 and various substrates, covering a wide range of work functions

  • From these measurements we can extract the changes in work function (Wf) with perovskite layer thickness as well as the evolution of the valence band onset EVB which are extracted from the spectra by linear extrapolation of the density of states (DOS)

  • For the substrates we find Wf(PEIE) = 3.11 eV, Wf(ITO) = 4.52 eV, Wf(PEDOT:PSS) = 5.12 eV, and Wf(MoO3) = 6.83 eV; these values are in good agreement to previously published work[35,36,37]

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Summary

Introduction

We present investigations on the interface formation between the hybrid perovskite MAPbI3 and various substrates, covering a wide range of work functions. Vacuum level alignment and flat-band conditions are commonly assumed when presenting energy level diagrams (see e.g. refs 18,19), neglecting the possible effects of interface dipole formation or band bending which can considerably alter the device performance. The method yields the ionization energy (IE), work function (Wf), and injection barrier of films, but due to the high surface sensitivity possible interface dipole formation and band bending can be probed by incrementally building up an interface. On p-type substrates like poly(3,4ethylenedioxythiophene)-poly(styrenesulfonate) (PEDOT:PSS), NiOx, p-Si, and Cu2O the Fermi level moves roughly to mid-gap, showing a Wf around 4.722,23,26,30,32 This means that the Fermi level position in the bandgap can be partially tuned by the contacting material, indicating a low intrinsic charge carrier density

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