Abstract
Substrate Bias Effects on Amorphous Carbon Film Deposition Process during Acetylene Plasma, Investigated with Infrared Spectroscopy
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Paper version not known
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Transactions of the Materials Research Society of Japan
Paper Title
Journal
Date
