Abstract

Subnanopore structural change of time-elapsed silica PECVD films elucidated by slow positron annihilation and ellipsometric porosimetry

Highlights

  • Nanoporous silica films have been widely utilized as various materials for low-k dielectrics, separation membranes, and so on

  • We aimed to examine the effect of the elapsed time on the nanoporosity of silica thin films, fabricated by plasma-enhanced chemical vapor deposition (PECVD), by means of low-energy positron annihilation lifetime spectroscopy (PALS) and vapor-adsorption ellipsometric porosimetry (EP)

  • The deposited films were kept under atmospheric conditions in Tsukuba, Japan for 6 months, in order to examine the effect of elapsed time on the pore structures of the prepared films

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Summary

Introduction

Nanoporous silica films have been widely utilized as various materials for low-k dielectrics, separation membranes, and so on. In order to improve their functionality, control of nanoscaled pore structures in silica films has been extensively investigated at the molecular level. Adequate stability of the pore structure is required to ensure the long-term usability of various devices using nanoporous silica films. Better understanding of the nanoscopic change of the pore structure with time is necessary to better estimate the functional lifetime. We aimed to examine the effect of the elapsed time on the nanoporosity of silica thin films, fabricated by plasma-enhanced chemical vapor deposition (PECVD), by means of low-energy positron annihilation lifetime spectroscopy (PALS) and vapor-adsorption ellipsometric porosimetry (EP)

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