Abstract
The formation of a spatial relief reproducing that of the anode as a result of the thermal poling of glasses and glass-metal nanocomposites in a strong electric field has been studied by atomic force microscopy. The anode surface patterns exhibited either a square grid or a rectangular grating with a depth of 120 nm, a strip width of 0.5 μm, and a period of 1 μm manufactured using electron-beam lithography and ion etching on the surface of an n-type single crystal silicon wafer. The relief depth formed on the surface of poled samples varied within 5–15 nm, depending on the experimental conditions. The mechanism of relief formation in this system is discussed.
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