Abstract
Laser fabrication of submicron hollow channel using a continuous wave (CW) light source is investigated. In conventional laser fabrication, CW laser beam affects the immediate vicinity of a beam exposure area because the fabrication employs a heat mode process. Our method proposed, however, three-dimensionally localizes the exposure area in a focal plane by controlling the reaction time constant of a photoresist film. As a result, we have fabricated a submicron hollow channel in the photoresist film using the CW laser source.
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