Abstract
Di-titanium nitride coatings were synthesized on commercial AISI 304 stainless steel using a Cathodic Arc Plasma Deposition (CAPD) technique. The effect of substrate bias voltage on the formation of coatings was studied keeping other parameters constant. The study revealed that 120 volts of substrate bias voltage is the most suitable for formation of Ti2N on the substrate. The thickness of the Ti2N coating was 0.70 to 0.80 μm for all the experiments. The hardness of the thin Ti2N coatings, determined by using Johnson and Hogmark relation was 2000 Hv. The structure of the coatings was studied by XRD. The surface roughness and texture was also studied which are important parameters for the given films. The case studies for high energy magnets and fertilizer industry are also discussed to show the worthiness of the work for industrial applications.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Protection of Metals and Physical Chemistry of Surfaces
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
