Sub-micrometer soft lithography of a bulk chalcogenide glass

Tomas Kohoutek,A Lindsay Greer,Hiroshi Fudouzi,Jiri Orava

doi:10.1364/oe.21.009584

Abstract

We demonstrate, for the first time, time- and cost-effective replication of sub-micrometer features from a soft PDMS mold onto a bulk chalcogenide glass over a large surface area. A periodic array of sub-micrometer lines (diffraction grating) with period 625 nm, amplitude 45 nm and surface roughness 3 nm was imprinted onto the surface of the chalcogenide AsSe(2) bulk glass at temperature 225°C, i.e. 5°C below the softening point of the glass. Sub-micrometer soft lithography into chalcogenide bulk glasses shows good reliability, reproducibility and promise for feasible fabrication of various dispersive optical elements, anti-reflection surfaces, 2D photonic structures and nano-structured surfaces for enhanced photonic properties and chemical sensing.

Highlights

Nano-imprint lithography (NIL) [1,2] is a highly scalable, effective, straightforward and low-cost parallel processing technique, which has been extensively used for surface patterning of inorganic and organic solids [4,5]
We demonstrate, for the first time, time- and cost-effective replication of sub-micrometer features from a soft PDMS mold onto a bulk chalcogenide glass over a large surface area
A periodic array of submicrometer lines with period 625 nm, amplitude 45 nm and surface roughness 3 nm was imprinted onto the surface of the chalcogenide AsSe2 bulk glass at temperature 225°C, i.e. 5°C below the softening point of the glass

Summary

Introduction

Nano-imprint lithography (NIL) [1,2] is a highly scalable (lateral resolution finer than 10 nm has been demonstrated [3]), effective, straightforward and low-cost parallel processing technique, which has been extensively used for surface patterning of inorganic and organic solids [4,5]. 1 Centre for Materials and Nanotechnologies, Faculty of Chemical Technology, University of Pardubice, CS.

Results

Conclusion