Abstract
This article studies the sub-linearity of the output characteristics measured in Schottky-barrier metal-oxide-semiconductor field-effect transistors with simulations and experiments. It is shown that the sub-linearity is not due to the forward-biased Schottky diode at the drain contact interface but due to the drain bias impact on the source-side Schottky-barrier, resulting in an increased carrier injection with increasing drain–source voltage. The simulation results are confirmed with the measurements of fabricated dual-gate Schottky-barrier transistors.
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