Abstract

The use of SU-8 as precursor for glass-like carbon, or glassy carbon, is presented here. SU-8 carbonizes when subject to high temperature under inert atmosphere. Although epoxy-based precursors can be patterned in a variety of ways, photolithography is chosen due to its resolution and reproducibility. Here, a number of improvements to traditional photolithography are introduced to increase the versatility of the process. The shrinkage of SU-8 during carbonization is then detailed as one of the guidelines necessary to design carbon patterns. A couple of applications—(1) carbon-electrode dielectrophoresis for bioparticle manipulation; and (2) the use of carbon structures as micro-molds are also presented.

Highlights

  • The focus of the work presented here is the derivation of glass-like carbon microstructures fromSU-8, an epoxy-based photoresist

  • Ongoing work is correlating the height and shape of the tapered structures depending on the exposure dose and baking times, towards developing design guidelines for the photolithography parameters needed for a specific tip radius and cone height

  • Several applications have been demonstrated using carbon structures derived from SU-8 patterned with photolithography, including capacitors [63], batteries [64,65] and a number of electrochemical sensors

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Summary

Introduction

The focus of the work presented here is the derivation of glass-like carbon microstructures from. Can be defined as the set of methods that can be used to derive glass-like carbon structures from patterned organic polymers, featuring dimensions ranging from hundreds of micrometers down to tens of nanometers. Glass-like carbon is impermeable to gases and extremely inert, with a remarkable resistance to chemical attack from strong acids, such as sulfuric and hydrofluoric, and other corrosive agents, such as bromine. It can be etched at high temperatures under oxygen atmosphere, but its rate of oxidation in oxygen, carbon dioxide or water vapor is lower than those of any other carbon. Two applications, carbon-electrode dielectrophoresis and carbon micromolds, developed by this author and his collaborators, are summarized

Photolithography of SU-8
Releasable Substrate for Free-Standing Parts
Dense Arrays of High Aspect Ratio Structures
Backexposure for Tapered Structures
Grayscale Photolithography
Carbonization
Selected Applications
Carbon-Electrode Dielectrophoresis
Carbon Micromolds
Findings
Conclusions

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