Abstract
This paper is devoted to investigation of the contact angle hysteresis on various surfaces. It was carried out by two different methods: measuring the advancing and the receding contact angles and measuring the contact angles at water droplet evaporation under isothermal conditions. Data obtained using two methods have been compared. The influence of the contact angle hysteresis on the mode of the drop evaporation has been shown.
Highlights
In connection with rapid development of electronic technology there is a need in creation of new highly efficient methods of heat transfer enhancement [1]
Studies of the properties of these surfaces, such as the contact angle hysteresis [3,4] play an important role in the choice of their application [5,6]
The contact angle and the contact angle hysteresis were measured by different methods
Summary
In connection with rapid development of electronic technology there is a need in creation of new highly efficient methods of heat transfer enhancement [1]. Studies of the properties of these surfaces, such as the contact angle hysteresis [3,4] play an important role in the choice of their application [5,6]. We study eight identical glass substrates with coatings applied using different technologies. The following coatings were considered: substrate manufactured using the silanization technology (absorption of trichloroctadecylsilane by silicon oxide); applying the photoresists of different types on a substrate, and applying a Teflon layer at various speeds of rotation. On these substrates, the contact angle and the contact angle hysteresis were measured by different methods. The measurements were carried out using the Drop Shape Analyzer from Kruss
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