Abstract
Ni and Ni-B films that contain 4–20 at % boron are produced by electroplating from baths containing sodium decahydroclovodecarborate and borane-morpholine as boron sources. The chemical state of Ni, B, and O atoms on the original film surface, as well as in that etched to 1 μm or annealed in air at 700°C was determined using X-ray photoelectron spectroscopy (XPS). Judging from the absolute values and directions of the peak shifts in XPS spectra of freshly obtained films, it is assumed that Ni and B atoms chemically interact with each other and Ni-Ni bonds are replaced by shorter Ni-B bonds. Boron is segregated in the surface layer of Ni-B films and hampers the thermal oxidation of nickel.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Protection of Metals and Physical Chemistry of Surfaces
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
