Abstract
In this paper CuO thin films were prepared by chemical spray pyrolysis method with different dopant concentration of Mn (0, 0.03, 0.05, 0.07 and 0.09)% deposited on glass substrates at (400) °C, and thickness of (450 ± 50) nm. Structural properties of (CuO: Mn) Thin films have been studied by X-ray diffraction (XRD), Field-Emission Scanning Electron Microscope (FESEM) and Atomic Force Microscope (AFM). The results showed that the structure of CuO thin films was of crystalline monoclinic and the (1-11) plane was the preferred orientation. In sewing study, the mean grain size decreased as the dopant (Mn) concentration increased in the (nm) range. Structural Parameters including dislocation intensity (δ), and the crystal number per unit area (No) was Counts too. Results of Atomic Force Microscopy (AFM) showed that the surface roughness and the root mean square roughness (RMS) decreased with the increasing of (Mn) dopant.
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