Study on the retention behavior of hydrogen isotopes and the change of chemical states of boron film exposed to hydrogen plasma in LHD

Abstract

The behavior of hydrogen retention and the change of chemical states of boron film exposed to hydrogen plasma in LHD were investigated. The sample was prepared in LHD, and atomic concentrations for the boron film after hydrogen plasma exposure were changed from 75% for boron, 15% for carbon and 8% for oxygen to 53%, 18% and 22%, respectively. BC bond was a major chemical state of the boron film after hydrogen plasma exposure, although abundance of BB bond was the highest before the plasma exposure. Total hydrogen retention measured by TDS was evaluated to be 1.7×1020Hm−2, and the retentions of hydrogen as BHB, BH and BCH bonds were, respectively, 4.8×1019, 7.2×1019 and 5.2×1019Hm−2. It was concluded that the hydrogen retention could be estimated by taking account not only of chemical states of impurities, but also of hydrogen depth profile.