Study on the Kinetics of NO Removal from Simulated Flue Gas by a Wet Ultraviolet/H2O2 Advanced Oxidation Process

Abstract

On the basis of the steady-state approximation theory and the two-film theory, the kinetic model of NO removal by a wet ultraviolet (UV)/H2O2 advanced oxidation process (AOP) was established. The mass-transfer reaction kinetic process of NO removal was also analyzed preliminarily. The results showed that the NO removal process by the wet UV/H2O2 AOP was a pseudo-first-order reaction for NO. The NO absorption process in the wet UV/H2O2 AOP system belonged to the fast reaction kinetic region. The chemical reaction process could be completed in the liquid film. The NO absorption rate mainly depended upon the chemical reaction rate, the diffusion rate, and the NO partial pressure, but it was not affected by the liquid-phase mass-transfer coefficient. Therefore, the NO absorption rate could be increased by improving the chemical reaction conditions, increasing the gas−liquid contact area, and raising the NO partial pressure. The comparison of experimental values and model values of pseudo-first-order reaction rate constants showed that the mass-transfer reaction kinetic model deduced had good reliability.