Abstract
Er2O3 films were deposited on Si(001) substrates by radio frequency magnetron technique. X-ray photoelectron spectroscopy, x-ray diffraction and atomic force microscopy show the Er2O3 films obtained are stoichiometric, amorphous, and uniform. The electronic structure is studied which shows a large energy gap value of the Er2O3 film, indicating Er2O3 film could be a promising antireflection coating for solar cells.
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