Study on the deposition of diamond-like carbon films in a low pressure cathode arc plasma

Abstract

The use of a low pressure cathode Arc plasma for the deposition of diamond-like carbon thin films is investigated. This plasma technique can generate an intense stable plasma of high electron density and high electron temperature, and so, has a capability to deposit homogeneous thin films at high deposition rates. The CH 4 and C 2H 2 gases were added in He plasma for preparing diamond-like carbon (DLC) films. Diagnostic measurements were performed on the arc plasma reactor for understanding the basic processes of depositing DLC films by an energy dispersive mass spectrometry. The diagnostic analysis reveals that CH 4 could be dissociated completely when it is introduced into the argon plasma. Raman spectroscopy was used to examine the structure of DLC films. A continuous indentation technique was utilized to investigate mechanical properties of DLC films.