Abstract
The sandwich structure of dielectric-metal-dielectric (DMD) was fabricated by ion beam-assisted deposition (IAD) under the oxygen atmosphere. The optical parameters were optimized by the admittance loci analysis to show that the transparent conducting oxide (TCO) film. By designing optical thickness of every ZnO layer and controlling the process parameters such as IAD power when fabricating DMD films at room temperature, we can obtain average transmittance of 90% in the visible region and bulk resistivity of 5×10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">-5</sup> Ω-cm.
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