Abstract
The effects of the main parameters of argon flux, oxygen flux and beam voltage on the surface morphology, transmittance spectrum and laser damage of the HfO2 single layers prepared by ion beam sputtering are studied. The HfO2 amorphous single layers have porous surface morphologies. Different processes will cause differences in coatings absorption and surface morphology, which in turn will cause changes in the spectral transmittance curve. The ion beam sputtering HfO2 single layers have high content of argon (4.5% - 8%). The laser damage of HfO2 single layers is related to argon inclusions and non-stoichiometric defects. The changes of argon flux and beam voltage have a greater impact on argon content and O/Hf ratio. When the argon content in the coatings is lower and the O/Hf ratio is higher, the laser damage thresholds of the HfO2 single layers are higher.
Highlights
HfO2 coatings have excellent photoelectric properties and high dielectric constant [1]-[6]
The effects of the main parameters of argon flux, oxygen flux and beam voltage on the surface morphology, transmittance spectrum and laser damage of the HfO2 single layers prepared by ion beam sputtering are studied
The HfO2 single layer is prepared by ion beam sputtering deposition (IBS) method
Summary
HfO2 coatings have excellent photoelectric properties and high dielectric constant [1]-[6]. It is an ideal material to replace semiconductor gate material SiO2 [7]. Because of low absorption coefficient and high transmittance from ultraviolet to infrared, HfO2 layers are commonly used optical coatings [8] [9]. Wide bandgap and high laser damage threshold, HfO2 layers are usually combined with SiO2 layers to prepare laser anti-reflection mirrors and high-reflection mirrors [10] [11]. The laser damage problem of HfO2 coatings has always been a research hotspot [12] [13] [14] [15] [16].
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