Abstract
Fluoropolymer films were deposited by plasma polymerization of 1.1.1-trifluoroethane (CF 3-CH 3). CF 3-CH 3 plasma polymerization characteristics and deposition rate of the polymer film were studied using a common industrial parallelplate plasma reactor. The chemical structure of the CF 3-CH 3 plasma polymer film was analyzed by FTIR and XPS techniques. The study shows that CF 3-CH 3 plasma polymerization is divided into two regions: energy deficient and monomer deficient. The deposition rate of the polymer film ( R d ) increased with an increase of W/F m , reached a maximum value, and then decreased. Analysis of the chemical structure indicates that the CF 3-CH 3 plasma polymer is CF 3, CF 2, CF, C-CFn, C-C groups, possessing a cross-linking network structure.
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