Abstract
In this paper, TiAlN hard thin film is deposited on hard alloy surface by magnetron sputtering; at 400 °C to 825 °C, oxidation experiment is performed for the samples; XRD is used for phase analysis of TiAlN hard thin film; Through the use of HVS-1000 digital micro-hardness tester and WS-2004 automatic scratching tester, microhardness of the samples and substrate-film adherence are analyzed. Results show: the microhardness and coherence of TiAlN thin film reduces with the rise of temperature; at 800 °C, the microhardness and substrate-film adherence remain at 1603 HV and 48 N respectively; it is found through comprehensive judgment that TiAlN thin film can work under 800 °C.
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