Abstract

Pulsed-laser deposited (Pb,Sr)TiO3 (PSrT) films on Pt/SiO2/Si substrate at various ambient oxygen pressures(PO2) are investigated in this work. Films deposited atPO2 below 100 mTorr exhibit the (100) preferred orientation and a tetragonal structure with largertetragonality. In addition, films deposited at 80 mTorr exhibit the most apparent ferroelectricproperties in contrast to those deposited at 200 mTorr. Moreover, films deposited at higherPO2 also exhibit longer lifetimes and higher breakdown fields due to their smaller leakagecurrent density, in terms of the reduction of defects, compensation of oxygen vacancies(OVs), an improved interface and small cluster sizes. An energy band model revealsthat fatigue properties of PSrT films are dominated by interfacial states at lowPO2 and by deep trappingstates at high PO2, which could be ascribed to OVs located at the interfaces and inside films, respectively.

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