Abstract
Cathode spot motion and macroparticles (MPs) reduction on related films are the two main issues in the application of the vacuum arc deposition (VAD). In the present work, an axisymmetric magnetic field (AMF) was applied to the cathode surface to investigate the influence of the AMF on the cathode spot motion and the MPs reduction on TiN films. The results show that the AMF affected the cathode spot motion by redistributing the dense plasma connected with the initiation of the new spot. With increasing AMF, there is an increasing tendency for the cathode spot to rotate and drift toward the cathode target edge. Based on the results of FEM simulation and the physical mechanism of the cathode spot discharge, the mechanism of the cathode spot motion in the AMF was discussed. The morphology, detailed size distribution, and roughness of the resultant TiN films were systematically investigated. Fewer and smaller MPs ejection is observed with an increase in the transverse component of AMF. The effect of the AMF on the MPs reduction on TiN films was discussed, and the results were compared with the theoretical predictions.
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