Abstract

AbstractWe investigate the residual vacancy defect species after crystallization of amorphous Si (a-Si) by solid phase epitaxy (SPE). To this end, we correlate the total and electronically-active doping concentrations measured by secondary mass spectrometry and spreading resistance analysis, and data from positron annihilation spectroscopy (PAS), which is sensitive to openvolume defects. Float-zone silicon substrates were implanted with boron, phosphorus and both phosphorus and boron ions to create nonuniform doping profiles at degenerate doping levels, after an amorphization step by 29Si+ ions. Samples were vacuum annealed at 600°C to induce SPE, and the SPE rate was measured by time-resolved reflectivity. PAS was used for identification of the impurity-defect complexes. Momentum-resolved PAS measurements enable the detection of phosphorus-vacancy (P-V) and oxygen-vacancy (O-V) complexes.

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