Abstract
Since the curvature of free-form surfaces are variable, it is difficult to guarantee the quality of the surface polished with traditional polishing technology. The chief aim of this paper is to investigate the features of an original elastic polishing wheel device. The polishing trajectory of the elastic polishing wheel was simulated to study the relationship between the uniformity of a kind of polishing trajectory and the ratio of rotational speed “i” which is the ratio of the velocity of the rotation and the revolution. Orthogonal experiment was carried out to explore the effect of various factors (rotational ratio, press amount h, speed of rotation, and granularity of abrasive grains) on surface roughness polished. The writer has come to the conclusion that i has an influence on the uniformity of polishing trajectory. The polishing coefficient of variation “CV” of i = 10.645751 is 32% lower than i = 10. Increasing the number of digits after the decimal point of i, the polishing track performs more uniform and densely. The experimental tests show that the influence of rotational ratio, press amount h, speed of rotation, and granularity of abrasive grains on surface roughness polished decreases progressively.
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More From: The International Journal of Advanced Manufacturing Technology
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