Study of titanium oxides using Auger line shapes

Abstract

The Ti L 2,3M 2,3V Auger line shape has been measured from TiO, Ti 2O 3, the anatase and rutile forms of TiO 2, chromic-acid-anodized Ti-6Al-4V, and reactive sputter-deposited TiO 2. The relationship between the positions of the peaks at ∼ 417–420 and ∼ 411–415 eV is shown to be a sensitive indicator of the average stoichiometry of the surface. No sputtered-induced reduction of the crystalline TiO, Ti 2O 3, and TiO 2 was seen, although a significant amount of reduction was observed for the amorphous TiO 2 thin films. This effect is attributed to the decreased thermodynamic stability of the amorphous films.