Abstract
The interaction of a low energy O+ ion beam on cuprate oxide, superconducting thin film surfaces was investigated in Ultra High Vacuum. Following the process by Reflection High Energy Electron Diffraction and Rutherford Backscattering and Ion Channeling we found that the O+ ion beam can change the surface structure, forming a different compound, and disordering the films, down to a depth of 300 Å. Using an Atomic Force Microscope we found that this process smoothes the surface of the films, with a rate that was found to be an exponential function of the ion energy, with a threshold energy of 50 eV.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Paper version not known
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
