Study of the residual surface resistance of niobium films at 1.5 GHz

Abstract

Potential contributions to the residual surface resistance of niobium films exposed to 1.5 GHz microwaves are reviewed and studied. These include the oxidation of the film surface, the formation of hydride precipitates, the contamination by noble gas atoms and the presence of macroscopic film defects such as those resulting from the roughness of the substrate. Particular attention is given to the dependence of the residual resistance on the amplitude of the microwave. Results similar to those obtained for bulk niobium provide strong evidence against the conjecture that the small size of the film grains should be a fundamental limitation to the production of films having a low residual resistance.