Abstract
Investigation of the magnetic microstructure of thin cobalt films, deposited by evaporation at an incidence angle of 45° in a vacuum, was conducted. The films were 40 nm and 100 nm thick. The magnetic microstructure of the films was observed with digitally enhanced Bitter pattern technique, and the films 40 nm in thickness were also studied by transmission electron microscopy (TEM) with comparatively high spatial resolution. Observations of the behavior of the Bitter patterns in external magnetic fields show that the magnetization of the films lies essentially in the film plane. The magnetic microstructure of the films 40 nm and 100 nm thick is composed of domains running predominantly in the direction perpendicular and parallel to the incidence plane, respectively. The direction in which domains are aligned is attributed to the structure of the films.
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